Explanation

The coating technology that directly deposits the ions generated by the ion source on the surface of materials. The ion team deposition device consists of an ion source, a vacuum chamber, a vacuum system, a control system and a power supply. The ion source used in ion team deposition usually requires metal ions to be directly used as plating material ions, which are generated by low-voltage arc discharge between electrode and molten metal. The characteristic of ion team deposition is that it is easy to control the energy of the deposited ions, which can deflect the ion beam. Therefore, the ion beam can be purified with a quality analyzer to obtain a high-purity film. ion team deposition requires an ion energy of about lOOOeV, and the coating rate is limited by the ion rate provided by the ion source, which is far lower than the vapor exposition and magnetic control probability used in industrial production. It is mainly used for the development of new film materials.

Classification