Explanation

sputtering coating technology using ion beam generated by ion source to bombard target materials. The ion beam sputtering device is mainly composed of ion source, vacuum chamber, vacuum system, control system and power supply. ion beam sputtering generally uses Kaufman wide beam ion source, which has uniform beam current. The diameter of the circular ion source outlet can reach over 100mm. The characteristics of ion beam sputtering are that the ion energy and beam density can be controlled respectively, and the substrate or workpiece does not contact the plasma. These are all beneficial for controlling the quality of the film layer. It is mainly used in the development of new materials.

Classification