Explanation

The technology of forming a surface coating with specific properties on the substrate by bombarding with low-energy ion beams while ion beam assisted deposition films. Its outstanding advantages are: ① the parameters of atomic deposition and ion implantation can be accurately adjusted independently; ② Capable of continuously growing thin films with several micrometers of thickness and consistent composition at lower bombardment energies; ③ Various films can be grown at room temperature to avoid the impact of high temperature treatment on materials, precision parts and components; ④ Form a continuous mixed layer at the interface between the film and substrate to improve adhesion. There are many types of equipment used for ion beam enhanced deposition. The film deposition methods include electron beam evaporation, ion beam sputtering deposition, molecular beam epitaxy, and atomic cluster system. Single ion beam emission deposition can also be used as a bombardment method. The ion beam energy used in ion beam enhanced deposition synthetic films is generally between 30eV and lOOkeV. High energy ion beams are commonly used for the synthesis of hard thin films. For optical coating, single crystal thin films should be grown by low energy ion beams. From the perspective of film synthesis process, ion beam enhanced deposition has film synthesis dominated by physical effects, such as Si3N4, BN, SiC, etc; Some thin film synthesis processes mainly involve chemical effects, such as TiN. It can also be used to synthesize gradient functional films, intelligent materials films and other surface layer materials.

Classification