Explanation

A lithography process additive. The pattern projected on the surface of the photoresistance is developed by using the difference in the solubility of the photoresistance before and after exposure. According to the different photoresistance, it can be divided into negative glue and positive glue. Generally, it is an organic solvent or alkaline aqueous solution, but due to the high cost and environmental pollution of organic solvent type, alkaline aqueous solution type is becoming increasingly mainstream. Alkali liquor is generally diluted by high concentration alkali liquor, and additive such as corresponding surfactants can be added according to actual needs. Commonly used alkalis include sodium carbonate, potassium carbonate, sodium hydroxide, potassium hydroxide, tetramethylammonium hydroxide, etc. The tetramethyl ammonium hydroxide developer has good development ability, and does not contain metal ions, so it will not have adverse effects on device performance. It has become the mainstream developer in the semiconductor industry, and the use concentration is usually about 2.38%.

Classification